跳到主要导航 跳到搜索 跳到主要内容

Electrical properties and strain distribution of Ge suspended structures

  • V. A. Shah
  • , S. D. Rhead
  • , J. Finch
  • , M. Myronov
  • , J. S. Reparaz
  • , R. J. Morris
  • , N. R. Wilson
  • , V. Kachkanov
  • , I. P. Dolbnya
  • , J. E. Halpin
  • , D. Patchett
  • , P. Allred
  • , G. Colston
  • , K. J.S. Sawhney
  • , C. M. Sotomayor Torres
  • , D. R. Leadley

科研成果: Article同行评审

3 引用 (Scopus)

摘要

Germanium membranes and microstructures of 50-1000 nm thickness have been fabricated by a combination of epitaxial growth on a Si substrate and simple etching processes. The strain in these structures has been measured by high-resolution micro-X-ray diffraction and micro-Raman spectroscopy. The strain in these membranes is extremely isotropic and the surface is observed to be very smooth, with an RMS roughness below 2 nm. The process of membrane fabrication also serves to remove the misfit dislocation network that originally forms at the Si/Ge interface, with benefits for the mechanical, optical and electrical properties of the crystalline membranes.

源语言English
页(从-至)13-18
页数6
期刊Solid-State Electronics
108
早期在线日期31 1月 2015
DOI
出版状态Published - 1 6月 2015

指纹

探究 'Electrical properties and strain distribution of Ge suspended structures' 的科研主题。它们共同构成独一无二的指纹。

引用此