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Weak anti-localization behavior of high mobility 2D hole gas in a strained Ge QW heterostructure

  • J. Foronda
  • , C. Morrison
  • , M. Myronov
  • , J. E. Halpin
  • , S. D. Rhead
  • , D. R. Leadley

Producción científica: Conference contribution

Resumen

In summary we have measured the low temperature and low field MR of a high mobility Ge 2DHG. The resulting MR curves demonstrate WL-like behavior at temperatures below 2K with WAL-like behavior appearing between 3K and 12K. Evidence of WAL has not been previously observed in Ge. We believe this transition to be the result of a summation of WL and WAL effects in the main conduction channel and parallel conduction channel(s). This is a promising result for Ge as a possible channel for future spin-FETs.

Idioma originalEnglish
Título de la publicación alojada2014 7th International Silicon-Germanium Technology and Device Meeting, ISTDM 2014
EditorialIEEE Computer Society
Páginas111-112
Número de páginas2
ISBN (versión impresa)9781479954285
DOI
EstadoPublished - 11 ago 2014
Evento7th International Silicon-Germanium Technology and Device Meeting, ISTDM 2014 - Singapore, Singapore
Duración: 2 jun 20144 jun 2014

Serie de la publicación

Nombre2014 7th International Silicon-Germanium Technology and Device Meeting, ISTDM 2014

Conference

Conference7th International Silicon-Germanium Technology and Device Meeting, ISTDM 2014
País/TerritorioSingapore
CiudadSingapore
Período2/06/144/06/14

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